Determination of Residual Stress of PACVD Nanostructure TiN Coatings by GIXRD Method

In this study, thin layers of titanium nitride (TiN) were deposited on H۱۳ steel substrates at different duty cycles and temperature of ۵۲۰ ˚C using plasma assisted chemical vapor deposition (PACVD). Uniaxial residual stress was calculated by X-ray diffraction (XRD) and Sin۲ Ψ method. Then the residual stress of the samples were measured by Grazing Incidence X-ray Diffraction (GIXRD) method and lattice parameter diagrams versus f(Ψ). Depth of penetration and texture coefficient in the samples were also evaluated. The surface morphology was examined using field-emission gun scanning electron microscope (FESEM) and the relationship of the stress and micro hardness test was also expressed. The results showed that by reducing duty cycles, residual stress decreases as well as with more changes of the lattice parameter, more changes of residual stress will be seen. Also, the microstructure result was in good agreement with theory and clearly displayed spherical morphology and uniform distribution of the created phases

Keywords:

tin , plasma assisted chemical vapor deposition , Residual Stress , GIXRD