فائزه حسنی - Departments of physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran
بتول سجاد - Departments of physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran
سیده ثریا موسوی - Departments of Physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran
مهرناز سیمدر - Departments of physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran
محمد امین بسام - Physics Department, Malek-Ashtar University of Technology, Lavizan, Tehran, Iran

The pulsed laser deposition is a practical synthesis route because of its unique advantages in growing various materials. Furthermore, the quality of thin films depends on different parameters in the deposition process. Meanwhile, ZnO has many applications in manufacturing optics, electronics, and optoelectronics instruments because of its exclusive properties. We have set up a PLD array to deposit the ZnO thin films on glass substrates. This study investigates the structural and optical characteristics of the films deposited at two different pulse repetition rates. Based on the optical-microscopic images and the scanning electron microscope (SEM) micrographs of films, increasing pulse repetition rate increases the uniformity of the particle size distribution and enhances film thickness. Also, the optical characterization performed by UV-Visible spectroscopy shows that the absorption and transmission rate, bandgap energy, and crystalline quality of the films can adjust by tuning the pulse repetition rate.

pulsed laser deposition, Pulse Repetition Rate, optical properties, Morphological Structure, Laser Fluency