Nucleation and Growth of Graphene on Polycrystalline Cu by Low Pressure Chemical Vapor Deposition

Publish Year: 1393
نوع سند: مقاله کنفرانسی
زبان: English
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شناسه ملی سند علمی:

MATHPHY02_153

تاریخ نمایه سازی: 30 شهریور 1394

Abstract:

This paper investigates the effects of growth time on the quality of graphene synthesized by low pressure chemical vapor deposition (LPCVD). Large-area single Layered Graphene is synthesized on polycrystalline Cu foil (~1cm2) by LPCVD. The synthesized graphene was characterized using Raman spectroscopy and scanning electron microscopy (SEM).The Raman spectrum showed a IG/I2D ~ 0.2 ratio which indicates that all samples are single-layer graphene and the SEM images demonstrate that the domain size increases when the growth time increases. The growth mechanism of LPCVD graphene on Cu and the mechanisms governing the Raman scattering process in the films are also discussed. The results provide important guidance toward the synthesis of high quality uniform graphene films.

Keywords:

Graphene , low pressure chemical vapor deposition , Raman Spectrum , Scanning

Authors

Azadeh jafari

Plasma Physics Research Center Islamic Azad University Science and Research Branch

Samineh Sarbazi Golazari

Plasma Physics Research Center Islamic Azad University Science and Research Branch

Mahmood Ghorannevis

Plasma Physics Research Center Islamic Azad University Science and Research Branch

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