Effects of duty cycle on the grain size and growth mechanism of nanostructured TiAlN coatings deposited by pulsed-DC PACVD method
Publish Year: 1393
نوع سند: مقاله کنفرانسی
زبان: English
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شناسه ملی سند علمی:
ICNN05_486
تاریخ نمایه سازی: 30 آبان 1394
Abstract:
The purpose of this paper is to investigate the relationship between duty cycle and the nucleation and growthmechanism of nanostructured titanium-aluminum nitride (TiAlN) coatings using pulsed-DC plasma-assisted chemicalvapor deposition (PACVD). In order to evaluate the effects of duty cycle, TiAlN coatings were applied for 150 minutein the 30, 40, and 50 % of duty cycle at 470 °C substrate temperature, 10 kHz frequency, and 3 mbar working pressure.The results obtained from SEM, XRD, and EDS tests imply the possibility of homogeneous and heterogeneous nucleationand island-layer growth of the TiAlN coatings. Due to the fact that nucleation and growth occurs in the off-time, thenumber of nuclei significantly increases with decreasing the duty cycle. Consequently, with reducing the duty cycle from50 to 30%, the grain size of the TiAlN coatings decreases from 24 to 14 nm.
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Authors
H Elmkhah
Department of Materials Engineering, Tarbiat Modares University, Tehran, Iran
A Abdollah-zadeh
Department of Materials Engineering, Tarbiat Modares University, Tehran, Iran
F Mahboubi
Department of Mining and Metallurgical Engineering, Amirkabir University of Technology, Tehran, Iran
A.R Sabour Rouhaghdam
Department of Materials Engineering, Tarbiat Modares University, Tehran, Iran