Effect of annealing on the Optical Properties of AlN Nanostructured thin films by DC Reactive Magnetron Sputtering

Aluminium Nitride Nano-Nano-structured thin films were deposited on quartz substrate (fused quartz) by DCreacqve magnetron spuering. The substrate was 400 ̊C. They were annealed at 650 and 850 C for 45 min in thepresence of nitrogen gas. To study optical properties of the samples and their morphology, UV-V spectrum and SEM micrographs respectively. after annealing, the films behave like an insulator. Optical transmission and optical band gap were increased and the roughness of layers was decreased after annealing.

Keywords:

annealing , DC magnetron sputtering , UV- Vis. , Optical Band Gap , Aluminium nitride