Glancing Angle Sputter Deposition of Molybdenum Nanorods for Field Emission Applications

Molybdenum nanorods are grown with a standard RF sputtering system, by incorporation of a glancingangle deposition (GLAD) method. An automated, highly accurate substrate rotating and tilting system is designed andimplemented to enable in situ control of the GLAD process both automatically and manually by an external computersystem. It is shown that nanorods with average radii of below 50 nm, and average length of 850 nm can be grown bycollimated sputtering at the RF power of 300W, substrate rotation speed of 8 rpm, and substrate tilt of 80 degrees. It isalso shown that the collimator is an essential part of the nanorod growth by GLAD sputtering method.

Keywords:

Molybdenum nanorods , Glancing Angle Deposition (GLAD) , sputtering