The surface topography of the semiconductor carbon-nickel composite films annealed at different temperatures

In this work, the fractal dimensions of carbon-nickel films annealed at different temperatures (300 – 1000 °C) were investigated. The RBS spectra show thatwith increasing the annealing temperatures, the concentration of nickel atoms into films decreases. The fractal dimensions and thetopography carbon-nickel films from 300 to800 °C are increased however; at 1000 °C these characteristics are decreased. It can be seen that at 500 °C films have maximum thefractal dimensions 2.54. The films annealed at 800 °C have maximum RMS roughness 3.03 nm.

Keywords:

annealing temperatures , carbon– nickel films , power spectra densities , fractal dimensions