A Novel Photoresist Composition based on Multifunctional Methacrylate Monomers for UV Lithography

In this work a novel UV photoresist material containing multifunctional methacrylate monomers has been introduced. The UV lithographic procedure via a photopolymerization of bis-GMA, TEGDMA and HEMA at room temperature was carried out by using 2, 2-dimethoxy-2-phenyl acetophenone, as a photoinitiator. Thesethree monomers were mixed with an initiator and then exposed to UV light. The resulting features were investigated by a scanning electron microscopy (SEM). The obtained results from micrograph images showed that the features including a series of pillars with micrometric size in diameters and heights. It can be concluded that this novel material was an appropriate candidate as a UV photoresist because of its capability to cure by UV light and solidify in shape of micrometric patterns as a composite mask

Keywords:

UV Lithography , Photoresist material , Polymerization , Bis-GMA , TEGDMA