Negative-Capacitance Effects in 2D Double Gate Field-Effect Transistors
عنوان مقاله: Negative-Capacitance Effects in 2D Double Gate Field-Effect Transistors
شناسه ملی مقاله: ICELE03_536
منتشر شده در سومین کنفرانس بین المللی مهندسی برق در سال 1397
شناسه ملی مقاله: ICELE03_536
منتشر شده در سومین کنفرانس بین المللی مهندسی برق در سال 1397
مشخصات نویسندگان مقاله:
Manouchehr Hosseini - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
Hamidreza Karami - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
Zahra Sohrabi - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
خلاصه مقاله:
Manouchehr Hosseini - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
Hamidreza Karami - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
Zahra Sohrabi - Department of Electrical Engineering, Bu-Ali Sina University, Hamedan, Iran
In this paper, a new 2D double gate field effect transistor (DGFET) is presented. In the proposed structureferroelectric is used in double side of the DGFET and single layer MoS2 has been used as the channel of the DGFET.The effect of ferroelectric layer on the subthreshold swing is investigated in the proposed DGFET using an analyticalsubthreshold model. Analytical models demonstrate that using ferroelectric in double side of 2-D DGFET improvesaverage subthreshold swing to about 18 mV/dec.
کلمات کلیدی: NCFET, MoS2, subthreshold swing, NCDGFET
صفحه اختصاصی مقاله و دریافت فایل کامل: https://civilica.com/doc/832026/