بررسی و مطالعه اثر ترابردی بر ناهمواری سطح تانتالوم با استفاده از کاشت یون پرانرژی آرگون
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تاریخ نمایه سازی: 16 فروردین 1402
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In the present study, effect of interfacial roughness on the ion implanted Tantalum based surfaces has been investigated. The argon ions with energy of ۳۰ keV and in doses of ۱×〖۱۰〗^۱۷, ۳×〖۱۰〗^۱۷, ۵×〖۱۰〗^۱۷, ۷×〖۱۰〗^۱۷, and ۱۰×〖۱۰〗^۱۷ (ion/cm۲) have been u
In the present study, effect of interfacial roughness on the ion implanted Tantalum based surfaces has been investigated. The argon ions with energy of ۳۰ keV and in doses of ۱×〖۱۰〗^۱۷, ۳×〖۱۰〗^۱۷, ۵×〖۱۰〗^۱۷, ۷×〖۱۰〗^۱۷, and ۱۰×〖۱۰〗^۱۷ (ion/cm۲) have been u
In the present study, effect of interfacial roughness on the ion implanted Tantalum based surfaces has been investigated. The argon ions with energy of ۳۰ keV and in doses of ۱×〖۱۰〗^۱۷, ۳×〖۱۰〗^۱۷, ۵×〖۱۰〗^۱۷, ۷×〖۱۰〗^۱۷, and ۱۰×〖۱۰〗^۱۷ (ion/cm۲) have been u
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