COMPARISON OF PROPERTIES OF TiN/TiCN AND PLASMA NITRIDING/TiCN FILMS DEPOSITED ON THE TOOL STEEL BY PULSED DC- PACVD

In this work, TiN/TiCN & PN/TiCN multilayer films were deposited by plasma- assisted chemical vapour deposition (PACVD). Plasma nitriding (PN) and TiN intermediate layer prior to coating leads to appropriate hardness gradient and it can greatly improve the mechanical properties of the coating. The composition, crystalline structure and phase of the films were investigated by X-ray diffraction. Atomic force microscopy and scanning electron microscopy were employed to observe the morphology and structure of the films. The TiCN layer exhibited a columnar structure. The adhesion force between the film and the tool steel substrate was ۳۰.۸ MPa for TiN/TiCN and ۲۵.۴ MPa for PN/TiCN film determined by pull off tests. The hardness of TiN/TiCN film was ۱۲.۷۵ GPa while it was ۵.۴ GPa for PN/TiCN film, respectively. The improvement of the adhesion in TiN/TiCN was attributed to a less gradient hardness configuration. In addition, the mean friction coefficients of the films were about ۰.۲ for TiN/TiCN and ۰.۳ for PN/TiCN film determined by nanoindentation tests.

Keywords:

PACVD , TiCN , TiN , Plasma nitriding , Multilayer