Role of Critical Processing Parameters on Fundamental Phenomena and Characterizations of DC Argon Glow Discharge

Given the significance of carefully analyzingthe critical range for processing parameters in asputtering system prior to experiments, as well as theireffect on the quality of the deposited thin film, thiscrucial subject has been simulated and researched in thisresearch. Argon glow discharge conditions were obtainedby altering essential processing factors such as electrodespacing, working pressure, and DC voltage delivered tothe electrodes. The effect of changing these processingparameters on the potential difference and electric fieldprofiles, ion- and electron-density, ion- and electronkineticenergy, and cross-section of fundamentalprocesses has been investigated to study the depositionrate and microstructural characteristics of thin films.Furthermore, the cross-section of fundamental ions-andelectroncollision processes like ionization, elasticscattering, excitation, and charge exchange has beeninvestigated.

Keywords:

Argon glow discharge , Electrodes distance , Working pressure , Applied power