Design and fabrication of multi-layers antireflection coating consisting of MgF۲ and SiO۲

In this research, MgF۲ and SiO۲ thin films were prepared by the magnetron sputtering method on glass and ITO substrates. The crystal structure, morphology, and antireflection performance of the coatings were characterized using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and ultraviolet spectrophotometry (UV-vis) techniques, respectively. Furthermore, by utilizing both experimental characterization and optical film design tools, the best experimental parameters for every coating were identified. FESEM images confirmed proper growth of the layers on the substrates. EDAX analysis revealed that the manufactured layer consisted of Magnesium fluoride and silica. The study of optical properties demonstrated that the average transmission in the ۴۰۰-۱۰۰۰ nanometer range exceeded ۹۹%, indicating good agreement with theoretical results. Furthermore, the use of ITO as the substrate reduced the bandgap.

Keywords:

MgF۲ and SiO۲ thin films , sputtering , ITO substrates