Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique

Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess ۶۰-۸۰% transmittance in the visible region. Calculating calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.

Keywords:

graphene oxide , Graphene Oxide thin film , Electrodeposition , GO optical band gap