UV/ H2O2 Advanced Oxidation Process for Simultaneous Removal of NO and SO2: A Review
Publish place: Gas Processing، Vol: 3، Issue: 2
Publish Year: 1394
Type: Journal paper
Language: English
View: 191
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Document National Code:
JR_GPJU-3-2_006
Index date: 11 January 2022
UV/ H2O2 Advanced Oxidation Process for Simultaneous Removal of NO and SO2: A Review abstract
This study presents a review on advanced oxidation processes (AOP) for simultaneous removal of NO and SO2. AOP is based on using a strong oxidant such as ozone and H2O2 which is able to generate highly reactive intermediates. The pollutant will be oxidized and removed by these intermediates. In recent years, AOP has been considered as an effective and attractive technology in the field of flue gas purification. In this paper, first, a brief overview on conventional methods for NOx removal is presented. Then the concepts of AOP are explained and the different AOPs are introduced. Since, H2O2 is widely used as a chemical oxidant in advanced oxidation processes, the most attention in this article is paid to the advanced oxidation with H2O2. On the other hand, the photochemical method (applying UV light) for producing active radicals in advanced oxidation process has become an attractive issue in recent years. Thus, the main focus of this study is on UV/H2O2 advanced oxidation process. The concepts, status of progress and attractive issues for future researches are discussed. .
UV/ H2O2 Advanced Oxidation Process for Simultaneous Removal of NO and SO2: A Review Keywords:
UV/ H2O2 Advanced Oxidation Process for Simultaneous Removal of NO and SO2: A Review authors
Masoumeh Moheb Shahrestani
Department of Chemical Engineering, College of Engineering, University of Isfahan, Isfahan, Iran
Amir Rahimi
Department of Chemical Engineering, College of Engineering, University of Isfahan, Isfahan, Iran
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