Effects of Plasma Discharge Parameters on the Nano-Particles Formation in the PECVD Reactor

In this paper, the effects of plasma discharge parameters on the nano particles formation process in a plasma enhanced chemical vapor deposition (PECVD) reactor using a model based on equations of ionization kinetics for different active species are studied. A radio frequency applied electric field causes ionization inside the reactor and consequently different reaction schemically active species are formed. The reactions leading to production of nano-particles include negative and positive ion, neutrals and radicals. The dependency of the background gas temperature, frequency and amplitude of applied electric field as the main plasma discharge parameters on the avalanche time constant, nano-particles formation and their growth rate is verified. Silane and hydrogen gases are considered as background species. It was observed that the growth rate at higher frequencies and lower temperatures is higher. It was seen that increase in the applied voltage peak amplitude affects charged and radical particles fairly similar to the applied voltage frequency.

Keywords:

PECVD Reactor , Equations of Kinetics , Silicon Amorphous Thin Film