Design and Realization of a Junction-less TFET for Analog and Digital Applications Based on Strain Engineering

Publish Year: 1401
نوع سند: مقاله ژورنالی
زبان: English
View: 119

This Paper With 8 Page And PDF Format Ready To Download

  • Certificate
  • من نویسنده این مقاله هستم

استخراج به نرم افزارهای پژوهشی:

لینک ثابت به این Paper:

شناسه ملی سند علمی:

JR_TDMA-11-2_002

تاریخ نمایه سازی: 26 دی 1401

Abstract:

This paper investigates the effects of the uniaxial tensile strain on the performance of an all silicon junction-less tunneling field-effect transistor (JLTFET) for analog and digital applications. The behavior of the JLTFET under global and local uniaxial strain are studied based on the energy band diagram at ON, OFF, and ambipolar states. Under local uniaxial tensile strain, it has been observed that the tunneling length at the channel/source interface in the ON state has been decreased and at the channel/drain interface in the OFF state has been increased. Simulations illustrate improvements in ON current, ION/IOFF and steep sub threshold swing (SS) and superior transconductance (gm). The strained JLTFET, also demonstrates capability for low-voltage application and high cut-off frequency (fT) and suppressed ambipolar current (Iamb).

Authors

Fayzollah Khorramrouze

Department of Electrical Engineering, Rasht Branch, Islamic Azad University, Rasht, Iran.

Seyed Ali Sedigh Ziabari

Department of Electrical Engineering, Rasht Branch, Islamic Azad University, Rasht, Iran.

Ali Heydari

Department of Electrical Engineering, Guilan University, Rasht, Ira

مراجع و منابع این Paper:

لیست زیر مراجع و منابع استفاده شده در این Paper را نمایش می دهد. این مراجع به صورت کاملا ماشینی و بر اساس هوش مصنوعی استخراج شده اند و لذا ممکن است دارای اشکالاتی باشند که به مرور زمان دقت استخراج این محتوا افزایش می یابد. مراجعی که مقالات مربوط به آنها در سیویلیکا نمایه شده و پیدا شده اند، به خود Paper لینک شده اند :
  • W. Y. Choi, B. G. Park, J. D. Lee, and ...
  • M. Rahimian and M. Fathipour, “N-P-N Bipolar Action in Junctionless ...
  • D. B. Abdi and M. J. Kumar, “Controlling ambipolar current ...
  • K. K. K and B. R. N, “Sub-threshold Leakage Current ...
  • P. K. Asthana, B. Ghosh, Y. Goswami, B. Mukund, and ...
  • S. B. Rahi, P. Asthana, and S. Gupta, “Heterogate junctionless ...
  • S. B. Rahi, B. Ghosh, and P. Asthana, “A simulation-based ...
  • X. Liu et al., “Study of novel junctionless Ge n-Tunneling ...
  • A. C. Seabaugh and Q. Zhang, “Low-voltage tunnel transistors for ...
  • K. Boucart and A. M. Ionescu, “Double-gate tunnel FET with ...
  • H. Aghandeh, S. Ali, and S. Ziabari, “Gate engineered heterostructure ...
  • R. Molaei Imen Abadi and S. A. Sedigh Ziabari, “Improved ...
  • Y. Goswami, P. Asthana, and B. Ghosh, “Nanoscale III–V on ...
  • J. Schulze et al., “Vertical Ge and GeSn heterojunction gate-all-around ...
  • H. D. Tsague and B. Twala, “Simulation and parameter optimization ...
  • M. Najmzadeh, L. De Michielis, D. Bouvet, P. Dobrosz, S. ...
  • S. Takagi, M. Kim, M. Noguchi, S. M. Ji, K. ...
  • S. Takagi and M. Takenaka, “Ge/III-V MOS device technologies for ...
  • M. K. Moghadam and S. E. Hosseini, “Investigation of a ...
  • M. Visciarelli, E. Gnani, A. Gnudi, S. Reggiani, and G. ...
  • T. A. Langdo et al., “SiGe-free strained Si on insulator ...
  • C. Grillet, D. Logoteta, A. Cresti, and M. G. Pala, ...
  • S. Saurabh and M. J. K. Ã, “Impact of Strain ...
  • Q. T. Zhao, J. M. Hartmann, and S. Mantl, “An ...
  • M. Kumar and S. Jit, “Effects of Electrostatically Doped Source/Drain ...
  • Q. T. Zhao et al., “Strained Si and SiGe nanowire ...
  • M. J. Kumar and S. Saurabh, “Tunnel Field Effect Transistor ...
  • D. K. Dash, P. Saha, and S. K. Sarkar, “Analytical ...
  • S. Kumar and B. Raj, “Compact channel potential analytical modeling ...
  • S. Kumar, E. Goel, K. Singh, B. Singh, M. Kumar, ...
  • R. Vishnoi and M. J. Kumar, “۲-D analytical model for ...
  • P. Palestri and C. Press, Nanoscale MOS transistors: Semi-classical modeling ...
  • M. J. Kumar, V. Venkataraman, and S. Nawal, “Analytical drain ...
  • S. Sharma, “An Analysis of Device Characteristics of Strained N-Channel ...
  • P. Pandey, R. Vishnoi, and M. J. Kumar, “A full-range ...
  • J. S. Lim, S. E. Thompson, and J. G. Fossum, ...
  • T. Numata, T. Mizuno, T. Tezuka, J. Koga, and S. ...
  • R. Molaei Imen Abadi et al., “An Improved Si Tunnel ...
  • نمایش کامل مراجع