Synthesis and Characterization of MgF۲/Cu Coating on Aluminum Produced by Sputtering Technique

Anti-reflective (AR) coatings that reduce surface reflectance have attracted more attention in a variety of applications. In this work, the structural and optical properties of MgF۲/Cu bilayer film as an AR coating on an aluminum substrate deposited by sputtering were investigated. The structural and morphological properties were studied by X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) respectively. The XRD patterns showed that the coating is composed of pure and crystalline phases. The FESEM and map images show a smooth coating with a uniform distribution of elements. The optical properties of the coating have been investigated by studying the reflectance spectra of the coating. The coverage showed the lowest reflection at high wavelengths. The adhesion strength of the films on the aluminum substrate was determined by a cross-cut test, which obtained a value of ۵B for each coating, which indicates the excellent strength of the coatings.

Keywords:

anti-reflectance , MgF۲/Cu coating , sputtering , physical vapor deposition layer