Al2O3 Nano-Cluster Deposition on Ni Substrate Surface: A Molecular Dynamics Study

The MD simulation is an effective way to study micro-scale molecular interactions. In this research the MDmethod is used to simulate the Al2O3 Nano-cluster deposition on Ni substrate in the ionized cluster beam (ICBD) process.We assume an ideal case of simulation in which the Al2O3 target and the Ni substrate in a system with a constanttemperature of 300 K. The surface roughness variations of the thin oxide film will be examined through the change ofthe incident energy with the amount of 10 to 120 eV and the two sizes of the Al2O3 clusters with 12 and 16 Å diameter.Our results show that there is a minimum for the surface roughness with increasing cluster energy.

Al2O3 Nano-Cluster Deposition on Ni Substrate Surface: A Molecular Dynamics Study Keywords:

Molecular dynamics , Nano-Cluster , Deposition , Thin Films , Ionized cluster beam