Expanded Channel in the SOI MESFET by SiGe Regions to Improve the Current Capability and High-Frequency Features
Publish place: Journal of Modeling & Simulation in Electrical & Electronics Engineering، Vol: 2، Issue: 3
Publish Year: 1401
نوع سند: مقاله ژورنالی
زبان: English
View: 18
This Paper With 9 Page And PDF Format Ready To Download
- Certificate
- من نویسنده این مقاله هستم
استخراج به نرم افزارهای پژوهشی:
شناسه ملی سند علمی:
JR_MSEEE-2-3_006
تاریخ نمایه سازی: 2 مهر 1403
Abstract:
In this paper, a novel structure for silicon on insulator metal semiconductor field effect transistors (SOI MESFETs) is introduced using the heterogeneous Si/SiGe region. SiGe semiconductor is used to expand the effective width of the drift region inside the buried oxide (BOX) layer. Due to its properties such as high electron mobility, high electron drift velocity, and excellent radio frequency (RF) performance, it significantly increases the current density of drain and other DC and RF parameters. Also, to control the critical electric field, which determines the breakdown voltage of the device, as well as to reduce the parasitic capacitance to improve its frequency characteristics, an additional oxide region between the gate and drain and below a part of the gate region is used. Numerical simulation shows that the drain current density and breakdown voltage of the proposed device compared to the conventional structure has been improved by ۱۲۰% and ۳۷%, respectively, resulting in a ۲ times increase in maximum output power density (Pmax). Also, the RF specifications of the new structure, including current gain (h۲۱), unilateral power gain (U), and maximum available power gain (MAG), have been improved by ۱۳۰%, ۸۵%, and ۶۵%, respectively. These specifications are proper for a device in high power and RF circuits like D-band applications.
Keywords:
breakdown voltage , Current density , Electric field , Frequency characteristics , Maximum output power density , SOI MESFET
Authors
Behrooz Fath-Gangi
Electronic Engineering, Faculty of Engineering, Lorestan University, Khoram-Abad, Iran.
Ali Mir
Electronic Engineering, Faculty of Engineering, Lorestan University, Khoram-Abad, Iran.
Ali Naderi
Faculty of Engineering, Imam Khomeini International University, Ghazvin, Iran.
Reza Talebzadeh
Faculty of Engineering, Lorestan University, Khoram-Abad, Lorestan, Iran.
Ali Farmani
Faculty of Engineering, Lorestan University, Khoram-Abad, Lorestan, Iran.
مراجع و منابع این Paper:
لیست زیر مراجع و منابع استفاده شده در این Paper را نمایش می دهد. این مراجع به صورت کاملا ماشینی و بر اساس هوش مصنوعی استخراج شده اند و لذا ممکن است دارای اشکالاتی باشند که به مرور زمان دقت استخراج این محتوا افزایش می یابد. مراجعی که مقالات مربوط به آنها در سیویلیکا نمایه شده و پیدا شده اند، به خود Paper لینک شده اند :