OPTIMIZATION OF GLUE AND THIOUREA CONSUMPTIONS IN THE ELECTROLYTE OF COPPER REFINING
Publish place: 8th National Iranian Chemical Engineering Congress
Publish Year: 1382
Type: Conference paper
Language: English
View: 2,056
This Paper With 6 Page And PDF Format Ready To Download
- Certificate
- I'm the author of the paper
Export:
Document National Code:
NICEC08_409
Index date: 27 February 2008
OPTIMIZATION OF GLUE AND THIOUREA CONSUMPTIONS IN THE ELECTROLYTE OF COPPER REFINING abstract
Thiourea and glue are the main organic additives that are used in electrorefining of copper. They produce smooth and hard deposit layer of copper on cathode and improve the cathode quality and hence prevent short circuiting in the electrical onnections. Optimizing the consumption of these additives is of greatest importance since their high concentration is not only uneconomical but also has the adverse effect.
In this investigation, the consumptions of these are optimized using several experiments and exact measurement of the parameters involved. The results of the experiments show that the optimum glue and thiourea consumption for a current density of 280 A/m2 are 65 and 70 g/tonCu respectively. For a current density of 300 A/m2 these figures are 75 g/tonCu for glue and 70 g/tonCu for thiourea.
OPTIMIZATION OF GLUE AND THIOUREA CONSUMPTIONS IN THE ELECTROLYTE OF COPPER REFINING authors
Daneshpajooh
R&D division, Sarcheshmeh copper complex, Sarcheshmeh, Iran
Vaghar
Tehran University, Tehran, Iran
Sarrafi
Shahid Bahonar University, Kerman, Iran
مراجع و منابع این Paper:
لیست زیر مراجع و منابع استفاده شده در این Paper را نمایش می دهد. این مراجع به صورت کاملا ماشینی و بر اساس هوش مصنوعی استخراج شده اند و لذا ممکن است دارای اشکالاتی باشند که به مرور زمان دقت استخراج این محتوا افزایش می یابد. مراجعی که مقالات مربوط به آنها در سیویلیکا نمایه شده و پیدا شده اند، به خود Paper لینک شده اند :