Effect of Magnetron Plasma Parameters on the Sputtered Thin Films of Copper
Publish place: 7th Iranian Seminar on Surface Engineering
Publish Year: 1385
Type: Conference paper
Language: English
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Document National Code:
ISSE07_069
Index date: 18 June 2008
Effect of Magnetron Plasma Parameters on the Sputtered Thin Films of Copper abstract
A sputtering apparatus was designed and manufactured with a planar circular DC magnetron. The effect of magnetic field lines on the plasma structure was shown using photo imaging. Unbalanced condition of the magnetron was demonstrated under different values of voltage, pressure and distance between cathode and substrate. The effect of these variables was studied on the coatings thicknesses, their composition and light absorption using the data from the experiments of light photo spectrometry. Keywords: sputtering; magnetron; absorption; spectrometry .
Effect of Magnetron Plasma Parameters on the Sputtered Thin Films of Copper authors
A. R. Rastkar
Laser-Plasma Research Institute, Shahid Beheshti University
A. R. Niknam
Laser-Plasma Research Institute, Shahid Beheshti University
B Shokri
Laser-Plasma Research Institute,Phys. Dept. and Laser-Plasma Research Institute, Shahid Beheshti University
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