Application of reactive DC magnetron sputtering system in fabrication of ananostructure copper oxide thin film as a sensing transducer
Publish place: 12th annual electrochemical seminar of Iran
Publish Year: 1395
نوع سند: مقاله کنفرانسی
زبان: English
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شناسه ملی سند علمی:
ELECTROCHEMISTRY012_107
تاریخ نمایه سازی: 5 آذر 1397
Abstract:
Uniform sputtered nanostructure copper oxide (Nano-CuO) thin film on the conductive fluorinatedtin oxide (FTO) substrate was obtained by reactive direct current (DC) magnetron sputtering system at the optimized instrumental deposition conditions. The deposited Nano-CuO thin film was characterized by using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive X-Ray spectroscopy (EDX), ultra-violet visible spectrophotometry and electrochemical methods. The crystalline phases, morphology, optical properties and resistivity of the Nano-CuO thin films are found to be significantly influenced by the changes in target-tosubstratedistance, Ar to O2 gas flow ratio, sputtering power and deposition time. The Nano-CuO thin film prepared at the optimum conditions has exhibited high porosity, uniformity and low resistivity; thus, it could be used as an excellent sensing transducer platform in biosensor fabrication.
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Authors
p Naderib
Thin Layer and Nanotechnology Laboratory, Institute of Chemical Technology, Iranian Research Organization forScience and Technology (IROST), Tehran, Iran
S. A Mozaffaria
Thin Layer and Nanotechnology Laboratory, Institute of Chemical Technology, Iranian Research Organization forScience and Technology (IROST), Tehran, Iran
M Saber Tehrani
Department of chemistry, Science and Research Branch, Islamic Azad University, Tehran, Iran
P Aberoomand Azar
Department of chemistry, Science and Research Branch, Islamic Azad University, Tehran, Iran