ناشر تخصصی کنفرانس های ایران

لطفا کمی صبر نمایید

Publisher of Iranian Journals and Conference Proceedings

Please waite ..
Publisher of Iranian Journals and Conference Proceedings
Login |Register |Help |عضویت کتابخانه ها
Paper
Title

A New Method for Multilevel Lithography

Year: 1399
COI: NANOB03_001
Language: EnglishView: 59
متن کامل این Paper منتشر نشده است و فقط به صورت چکیده یا چکیده مبسوط در پایگاه موجود می باشد.
توضیح: معمولا کلیه مقالاتی که کمتر از ۵ صفحه باشند در پایگاه سیویلیکا اصل Paper (فول تکست) محسوب نمی شوند و فقط کاربران عضو بدون کسر اعتبار می توانند فایل آنها را دریافت نمایند.

Buy and Download

متن کامل (فول تکست) این مقاله منتشر نشده و یا در سایت موجود نیست و امکان خرید آن فراهم نمی باشد.

Authors

Amirali Ebadi - Computer and Electrical Engineering Department, College of Engineering, University of Tehran, Tehran, Iran
Mohsen Haajari - Research and Development Department – LAMA Electronic Company -Mashhad - Iran
Zeinab NezafatYazdi - Department of Biology, Faculty of Science, Islamic Azad University Mashhad Branch, Mashhad, Iran
Alireza Einabadi - Faculty of Electrical and Computer Engineering, Tarbiat Modares University, Tehran, Iran
Olya Shamsian - Department of Mechanical Engineering, Shahid Beheshti University, Tehran, Iran
Madjid Soltani - Department of Mechanical Engineering, K. N. Toosi University of Technology, Tehran, Iran

Abstract:

Fabrication of microfluidic and lab-on-chip devices has played an influential role in nano/microtechnology industries in recent years. One of the main challenges in the fabrication of microfluidic devices is ۳D mold production. There are many methods of ۳D mold fabrication, with their advantages and disadvantages. In this research, a new method for low-cost ۳D mold fabrication is presented. The Bis-GMA photoresist has been used for this research. This photoresist does not need a pre-bake step, and by using this method, spin-coating will be eliminated. We have produced ۳D molds utilizing a liquid photoresist in an inverse exposure system and a grayscale mask to control the cured photoresist's thickness. This method's main features include low production cost, elimination of the spin coating step, not needing pre-bake, and multilevel mold fabrication in one lithography step. This method is useful for fabricating ۳D microfluidic devices and microfluidic AFM cantilevers.

Keywords:

Paper COI Code

This Paper COI Code is NANOB03_001. Also You can use the following address to link to this article. This link is permanent and is used as an article registration confirmation in the Civilica reference:

https://civilica.com/doc/1196576/

How to Cite to This Paper:

If you want to refer to this Paper in your research work, you can simply use the following phrase in the resources section:
Ebadi, Amirali and Haajari, Mohsen and NezafatYazdi, Zeinab and Einabadi, Alireza and Shamsian, Olya and Soltani, Madjid,1399,A New Method for Multilevel Lithography,Third International Conference on Interdisciplinary Studies in Nanotechnology,Tehran,https://civilica.com/doc/1196576

Research Info Management

Certificate | Report | من نویسنده این مقاله هستم

اطلاعات استنادی این Paper را به نرم افزارهای مدیریت اطلاعات علمی و استنادی ارسال نمایید و در تحقیقات خود از آن استفاده نمایید.

Scientometrics

The specifications of the publisher center of this Paper are as follows:
Type of center: دانشگاه دولتی
Paper count: 64,101
In the scientometrics section of CIVILICA, you can see the scientific ranking of the Iranian academic and research centers based on the statistics of indexed articles.

New Papers

Share this page

More information about COI

COI stands for "CIVILICA Object Identifier". COI is the unique code assigned to articles of Iranian conferences and journals when indexing on the CIVILICA citation database.

The COI is the national code of documents indexed in CIVILICA and is a unique and permanent code. it can always be cited and tracked and assumed as registration confirmation ID.

Support