Electrodeposition of CoNi/Cu Multilayer Nanowires for magnetic Sensors Applications

Undoubtly, electrochemical deposition is the most appropriate technique to fabricate multilayer nano-materials, due to its high advantages like low cost, simple mechanism and good control on deposited structures. Magnetic multiayer nanowires have been studied for last decades because of their high-tech application in high density storage Medias and micro-switch magnetic sensors [1-5]. They are frequently fabricated in aluminum anodic oxide and track-etched polycarbonate membranes with high aspect ratios which provides greater magnetoresistive coefficient. Moreover, multilayer nanowires with low spacer thickness, showed to have more MR ratio under current perpendicular in plane [1, 2, 6]. These advantages made the researchers to study their capability in mentioned application. In this research, CoNi/Cu multilayer nanowires were fabricated via DC pulse electrodeposition technique and their structures was studied for later application in micro-switch sensors