Investigation of four phase semiconductor layer Ni/MgF2/glass producted by PVD method

According to the increasing advancement of nanotechnology and ample use of nanostructure layers in various fields like optic pieces, photic devices, solar cells, and biological drugs; manufacturing better and morecommodious layers seems necessary. In this survey, aluminum has been layered and deposited on silver nitrateon glass using PVD method. Atomic force microscope (AFM),X-ray diffraction( XRD), and Scanning electronmicroscope( SEM) analyses, and spectrophotometery were derived from this multi-layer, and through these analyses, the structure of the surface and the morphology of theses layers were studied.

Investigation of four phase semiconductor layer Ni/MgF2/glass producted by PVD method Keywords:

Multilayer semiconductors , Nanostructures , PVD(physical vapor deposition) , Crystalography