Synthesis of Manganese Oxide Thin Film by Aerosol-Assisted Chemical Vapor Deposition
Publish place: 16th Iranian National Chemical Engineering Congress
Publish Year: 1397
نوع سند: مقاله کنفرانسی
زبان: English
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شناسه ملی سند علمی:
NICEC16_712
تاریخ نمایه سازی: 7 خرداد 1398
Abstract:
The production of transition metal oxides (TMOs) thin films has become the attention of a great deal of research throughout academia and industry worldwide because of their various applications. Among common deposition techniques, chemical vapor deposition (CVD) is an attractive process for the production of TMOs due to its capability to control composition, crystal structure and morphology of deposited film, even on large scales. Conventional CVD processes can be limited, however, by the need for suitably volatile precursors. As a variant of conventional CVD processes Aerosol-assisted (AA)CVD is a solution-based process which alleviates the need for volatile precursors and offers a wide range of precursors. This paper reports the successful deposition of manganese oxide thin film on heated glass substrate (350°C) by AACVD method. The precursor was a solution of manganese acetylacetonate (Mn(acac)2) in methanol. The microstructure and composition of the deposited are characterized using scanning electron microscopy (SEM) and Raman spectroscopy.
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Authors
Cavus Falamaki
Department of Chemical Engineering, Amirkabir University of Technology, Tehran, Iran
Aidin Manafi
Department of Chemical Engineering, Amirkabir University of Technology, Tehran, Iran
Golnoosh Mir Moghtadaei
Department of Chemical Engineering, Amirkabir University of Technology, Tehran, Iran